Hypervalent Iodine Chemistry

Hypervalent Iodine-Induced Oxidative Couplings (New Metal-Free Coupling Advances and Their Applications in Natural Product Syntheses) -- Toshifumi Dohi and Yasuyuki Kita Phenol Dearomatization with Hypervalent Iodine Reagents -- Stéphane Quideau, Laurent Pouységu, Philippe A. Peixoto, and Denis Deff...

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Detaylı Bibliyografya
Müşterek Yazar: SpringerLink (Online service)
Diğer Yazarlar: Wirth, Thomas (Editör)
Materyal Türü: e-Kitap
Dil:İngilizce
Baskı/Yayın Bilgisi: Cham : Springer International Publishing : Imprint: Springer, 2016.
Edisyon:1st ed. 2016.
Seri Bilgileri:Topics in Current Chemistry, 373
Konular:
Chemistry, Organic.
Catalysis.
Chemistry, Technical.
Organic Chemistry.
Industrial Chemistry.
Online Erişim:Full-text access
OPAC'ta görüntüle
Diğer Bilgiler
Özet:Hypervalent Iodine-Induced Oxidative Couplings (New Metal-Free Coupling Advances and Their Applications in Natural Product Syntheses) -- Toshifumi Dohi and Yasuyuki Kita Phenol Dearomatization with Hypervalent Iodine Reagents -- Stéphane Quideau, Laurent Pouységu, Philippe A. Peixoto, and Denis Deffieux Oxidative Heterocycle Formation Using Hypervalent Iodine(III) Reagents -- Sandip Murarka and Andrey P. Antonchick Aminations with Hypervalent Iodine -- Kilian Muñiz Arylation with Diaryliodonium Salts -- Berit Olofsson Iodanes as Trifluoromethylation Reagents -- Natalja Früh, Julie Charpentier, and Antonio Togni Alkynylation with Hypervalent Iodine Reagents -- Jerome Waser Rearrangements Induced by Hypervalent Iodine -- Gaëtan Maertens, Sylvain Canesi Asymmetric Synthesis with Hypervalent Iodine Reagents -- Ravi Kumar, Thomas Wirth Organoiodine(III) Reagents as Active Participants and Ligands in Transition Metal-Catalyzed Reactions: Iodosylarenes and (Imino)iodoarenes -- John D. Protasiewicz Halogen Bonding in Hypervalent Iodine Compounds -- Luca Catalano, Gabriella Cavallo, Pierangelo Metrangolo , Giuseppe Resnati , Giancarlo Terraneo.
Fiziksel Özellikler:VIII, 316 p. online resource.
ISBN:9783319337333
ISSN:1436-5049 ;
DOI:10.1007/978-3-319-33733-3

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