Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-asse...

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Bibliographic Details
Main Authors: Shim, Seongbo (Author), Shin, Youngsoo (Author)
Corporate Author: SpringerLink (Online service)
Format: e-Book
Language:English
Published: Cham : Springer International Publishing : 2018.
Imprint: Springer,
Edition:1st ed. 2018.
Series:NanoScience and Technology,
Subjects:
Nanotechnology.
Microtechnology.
Microelectromechanical systems.
Electronic circuits.
Optical materials.
Nanoscience.
Semiconductors.
Microsystems and MEMS.
Electronic Circuits and Systems.
Optical Materials.
Nanophysics.
Online Access:Full-text access
Description
Summary:This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Physical Description:XIV, 138 p. 92 illus., 54 illus. in color. online resource.
ISBN:9783319762944
ISSN:2197-7127
DOI:10.1007/978-3-319-76294-4

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