Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-asse...

Ful tanımlama

Detaylı Bibliyografya
Asıl Yazarlar: Shim, Seongbo (Yazar), Shin, Youngsoo (Yazar)
Müşterek Yazar: SpringerLink (Online service)
Materyal Türü: e-Kitap
Dil:İngilizce
Baskı/Yayın Bilgisi: Cham : Springer International Publishing : 2018.
Imprint: Springer,
Edisyon:1st ed. 2018.
Seri Bilgileri:NanoScience and Technology,
Konular:
Nanotechnology.
Microtechnology.
Microelectromechanical systems.
Electronic circuits.
Optical materials.
Nanoscience.
Semiconductors.
Microsystems and MEMS.
Electronic Circuits and Systems.
Optical Materials.
Nanophysics.
Online Erişim:Full-text access
Diğer Bilgiler
Özet:This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Fiziksel Özellikler:XIV, 138 p. 92 illus., 54 illus. in color. online resource.
ISBN:9783319762944
ISSN:2197-7127
DOI:10.1007/978-3-319-76294-4

Benzer Materyaller