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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-asse...
| Main Authors: | , |
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| Corporate Author: | |
| Format: | e-Book |
| Language: | English |
| Published: |
Cham :
Springer International Publishing : Imprint: Springer,
2018.
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| Edition: | 1st ed. 2018. |
| Series: | NanoScience and Technology,
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| Subjects: | |
| Online Access: | Full-text access View in OPAC |