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Principles of chemical vapor deposition /

Bibliographic Details
Main Author:	Dobkin, Daniel Mark
Other Authors:	Zuraw, Michael K.
Format:	Book
Language:	English
Published:	Dordrecht ; Boston : Kluwer Academic Publishers, 2003.
Subjects:	Vapor-plating. Buhar-kaplama. Chemical engineering. Kimya mühendisliği. Nuclear physics. Nükleer fizik.
Online Access:	View in OPAC

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