Principles of chemical vapor deposition /

Bibliographic Details
Main Author: Dobkin, Daniel Mark
Other Authors: Zuraw, Michael K.
Format: Book
Language:English
Published: Dordrecht ; Boston : Kluwer Academic Publishers, 2003.
Subjects:
Vapor-plating.
Buhar-kaplama.
Chemical engineering.
Kimya mühendisliği.
Nuclear physics.
Nükleer fizik.
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Merkez Kütüphane

Holdings details from Merkez Kütüphane
Call Number: TS695 D635 2003
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