Design for Manufacturability with Advanced Lithography

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufactur...

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Detaylı Bibliyografya
Asıl Yazarlar: Yu, Bei (Yazar), Pan, David Z. (Yazar)
Müşterek Yazar: SpringerLink (Online service)
Materyal Türü: e-Kitap
Dil:İngilizce
Baskı/Yayın Bilgisi: Cham : Springer International Publishing : 2016.
Imprint: Springer,
Edisyon:1st ed. 2016.
Konular:
Electronic circuits.
Microprocessors.
Computer architecture.
Electronics.
Electronic Circuits and Systems.
Processor Architectures.
Electronics and Microelectronics, Instrumentation.
Online Erişim:Full-text access
İçindekiler:
  • Introduction
  • Layout Decomposition for Triple Patterning
  • Layout Decomposition for Other Patterning Techniques
  • Standard Cell Compliance and Placement Co-Optimization
  • Design for Manufacturability with E-Beam Lithography
  • Conclusions and Future Works.-.

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