Design for Manufacturability with Advanced Lithography

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufactur...

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Bibliographic Details
Main Authors: Yu, Bei (Author), Pan, David Z. (Author)
Corporate Author: SpringerLink (Online service)
Format: e-Book
Language:English
Published: Cham : Springer International Publishing : 2016.
Imprint: Springer,
Edition:1st ed. 2016.
Subjects:
Electronic circuits.
Microprocessors.
Computer architecture.
Electronics.
Electronic Circuits and Systems.
Processor Architectures.
Electronics and Microelectronics, Instrumentation.
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