Loading…
Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barrier layer material. Pursuing a systematic approach to resolve the remaining critical issues in the CMP, it first investigates the tribocorro...
| Main Author: | |
|---|---|
| Corporate Author: | |
| Format: | e-Book |
| Language: | English |
| Published: |
Singapore :
Springer Nature Singapore :
2018.
Imprint: Springer, |
| Edition: | 1st ed. 2018. |
| Series: | Springer Theses, Recognizing Outstanding Ph.D. Research,
|
| Subjects: | |
| Online Access: | Full-text access |
| Summary: | This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barrier layer material. Pursuing a systematic approach to resolve the remaining critical issues in the CMP, it first investigates the tribocorrosion properties and the material removal mechanisms of copper (Cu) and Ru in KIO4-based slurry. The thesis subsequently studies Cu/Ru galvanic corrosion from a new micro and in-situ perspective, and on this basis, seeks ways to mitigate corrosion using different slurry additives. The findings presented here constitute a significant advance in fundamental and technical investigations into the CMP, while also laying the groundwork for future research. |
|---|---|
| Physical Description: | XVIII, 137 p. 103 illus. online resource. |
| ISBN: | 9789811061653 |
| ISSN: | 2190-5061 |
| DOI: | 10.1007/978-981-10-6165-3 |